%0 Journal Article
%T Nanocrystalline SiC Films Grown Si by HFCVD Method and Its Photoluminescence<br>在硅衬底上用HFCVD法生长的纳米SiC薄膜及其室温光致发光
%A YU Ming
%A |bin
%A MA Jian
%A |ping
%A LUO Jia
%A |jun
%A CHEN Zhi
%A |ming
%A <br>余明斌
%A 马剑平
%A 罗家骏
%A 陈治明
%J 半导体学报
%D 2000
%I 
%X The nano\|crystalline silicon carbide films are grown on Si substrates by Hot Filament Chemical Vapor Deposition (HFCVD).X\|Ray Diffraction (XRD),X\|ray Photoelectron Spectrum (XPS), Fourier Infrared Absorb Spectrum (FTIR),Ultraviolet Raman Scatter Spectrum,High definition Rate Transmission Electron Microscope (HRTEM) and many other methods are employed to analyze the composition and the structure of the films.The results reveal that the films should be provided with nanocrystalline characteristic in structure.Intensive visible\|light emitting has been observed at room temperature in photoluminescence experiments.
%K nano\|crystalline materials
%K SiC
%K thin film
%K photoluminescence<br>纳米材料
%K 碳化硅
%K 薄膜
%K 光致发光
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=B19C93D9F727D6D6&yid=9806D0D4EAA9BED3&vid=659D3B06EBF534A7&iid=DF92D298D3FF1E6E&sid=B28C697BC3A1BA62&eid=5AE7FA263C8A6D65&journal_id=1674-4926&journal_name=半导体学报&referenced_num=13&reference_num=6