%0 Journal Article
%T Optimization Algorithm for Model-Based Optical Proximity Correction<br>优化的基于模型的光学邻近矫正算
%A Cai Yici
%A Wang Yang
%A Zhou Qiang
%A Hong Xianlong
%A <br>蔡懿慈
%A 王旸
%A 周强
%A 洪先龙
%J 半导体学报
%D 2005
%I 
%X The optimization algorithm considering the surrounding feature influences is presented.The algorithm implements the single loop optimization for the target feature and the dual loop optimization between the target features and the surrounding features by using the self adaptive step cutting and moving strategy.The experiments show that this algorithm can achieve much improvement in correction precision and efficiency.
%K optical lithography
%K OPE
%K model-based OPC<br>光刻
%K 光学邻近效应
%K 基于模型的光学邻近矫正
%K 优化
%K 基于模型
%K 光学
%K 正算法
%K Optical
%K Proximity
%K Correction
%K Algorithm
%K 结果
%K 实验
%K 速度
%K 精度
%K 矫正
%K 系统
%K 适应性
%K 移动步长
%K 切割
%K 线段
%K 影响
%K 图形
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=83FF060AD6D3DD57&yid=2DD7160C83D0ACED&vid=96C778EE049EE47D&iid=38B194292C032A66&sid=ED9DF3402785F68D&eid=10A39635766FF5D0&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=9