%0 Journal Article
%T Research of Model for Ion Implantation Equipment in Integrated Circuit Technology Simulation<br>集成电路工艺模拟中的离子注入设备模型研究
%A Li Yu
%A Li Ruiwei
%A Wang Jimin
%A <br>李煜
%A 李瑞伟
%A 王纪民
%J 半导体学报
%D 2002
%I 
%X With the rapid development in the process of integrated circuits,the function of the process simulation software has been improved constantly,but its shortcoming appears increasingly.The influence of equipment on the process has not been counted in.In order to promote the improvement of this situation,it is necessary to establish an equipment model in process simulation.Taking the process of ion implantation as an example,some elementary research on ion implantation equipment model considering the influence of the channeling effects on the process is accomplished.
%K equipment model
%K process simulation
%K ion implantation
%K channeling effects<br>设备模型
%K 工艺模拟
%K 离子注入
%K 沟道效应
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=4A21D89CC6160C02&yid=C3ACC247184A22C1&vid=EA389574707BDED3&iid=38B194292C032A66&sid=160561E9A96393DE&eid=3224764AEAFCF8C2&journal_id=1674-4926&journal_name=半导体学报&referenced_num=1&reference_num=7