%0 Journal Article
%T Method for Fabricating Submicron Spaces
一种制作亚微米间隔的方法
%A Xie Kexun/Microelectronics Technical Institute
%A Shanghai Jiao Tong UniversityJiang Jianfei/Microelectronics Technical Institute
%A Shanghai Jiao Tong UniversityXie Ying/Microelectronics Technical Institute
%A Shanghai Jiao Tong University
%A
谢可勋
%A 蒋建飞
%A 谢缨
%J 半导体学报
%D 1989
%I
%X 本文研究了利用光刻图形转移过程中,湿法化学刻蚀存在的侧向钻蚀,通过对钻蚀程度的控制获得小于0.5μm的线条间隔.
%K Submicron technique
%K Chemical etching
%K Josephon junction
亚微米技术
%K 化学刻蚀
%K 约瑟夫逊结
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=0C417A6934DA9E05&yid=1833A6AA51F779C1&vid=F3090AE9B60B7ED1&iid=DF92D298D3FF1E6E&sid=20C3B205768D55E0&eid=652E7E360EBE3082&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=1