%0 Journal Article
%T Numerical Analysis for Polarization Compensation of Silica on Silicon AWG Using SiON<br>SiON对Si基SiO_2AWG偏振补偿的数值分析
%A An Junming
%A Gao Dingshan
%A Li Jian
%A Li Jianguang
%A Wang Hongjie
%A Hu Xiongwei
%A <br>安俊明
%A 郜定山
%A 李健
%A 李建光
%A 王红杰
%A 胡雄伟
%J 半导体学报
%D 2004
%I 
%X The influence of high refraction index SiON film on stress birefringence of waveguide in silica on silicon arrayed waveguide grating(AWG) is analyzed systematically using full vector alternating direction implicit(ADI) iterative method.The result shows that the stress birefringence of the waveguide in silica on silicon AWG can be improved by depositing SiON film above or below the waveguide,but the position of the mode profile will deflect the centre of the waveguide in this condition.The deflection can be improved by depositing the SiON film both above and below the waveguide.A polarization independent 16 channels AWG is theoretically designed using this method.
%K SiON film
%K silica optical waveguide on silicon
%K stress
%K birefringence
%K AWG
%K polarization compensation<br>SiON薄膜
%K Si基SiO2波导
%K 应力
%K 双折射
%K 阵列波导光栅
%K 偏振补偿
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=9F48DBC1BC58791F83708933755BDDCA&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=DF92D298D3FF1E6E&sid=9596F7248FB5796B&eid=D5B44BB3CCE27369&journal_id=1674-4926&journal_name=半导体学报&referenced_num=1&reference_num=9