%0 Journal Article
%T Focused Ion Beam Induced Metalorganic Chemical Vapor Deposition of C-Pt Thin Film<br>聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜
%A Jiang Suhua
%A Tang Ling
%A Wang Jiaji
%A <br>江素华
%A 唐凌
%A 王家楫
%J 半导体学报
%D 2004
%I 
%X C-Pt film is prepared by focused ion beam induced MOCVD.A theoretical model is presented to describe the relationship between deposition rate and processing parameters.From the experiment,the deposition rate increases and the resistivity of thin film decreases with the rising of ion beam current.The varying composition of C-Pt film and the mechanism of experimental result are also discussed.
%K focused ion beam
%K MOCVD
%K platinum
%K carbon
%K thin film<br>聚焦离子束
%K 金属有机化学气相淀积
%K 薄膜
%K 铂
%K 碳
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=5A271883FAFDBC61&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=708DD6B15D2464E8&sid=E34F1AE8B0BD0598&eid=5670EE5C13D54BD2&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=12