%0 Journal Article
%T Flame Hydrolysis Deposition of Germanium Doped Silicaon Silicon Substrate<br>Si基片上掺Ge SiO_2的火焰水解法制备
%A Gao Dingshan
%A Li Jianguang
%A Wang Hongjie
%A An Junming
%A Li Jian
%A Xia Junlei
%A Hu Xiongwei
%A <br>郜定山
%A 李建光
%A 王红杰
%A 安俊明
%A 李健
%A 夏君磊
%A 胡雄伟
%J 半导体学报
%D 2004
%I 
%X Germanium doped silica (GeO 2-SiO 2) soot is deposited on single crystal silicon substrate by flame hydrolysis deposition.Then this soot is consolidated to form glass in a high-temperature furnace.The surface morphologies of the samples are viewed by optic microscope,and the influence of different consolidating processes on the morphologies of the samples is studied.X-ray photoelectron spectroscopy is used to determine the elemental composition of the samples.The refractive indexes and thicknesses of the samples are measured by prism coupling method.All results show that the GeO 2-SiO 2 glass fabricated by appropriate process has smooth surface and tunable refractive index and thickness.This GeO 2-SiO 2 glass can be used as the core layer of silica-on-silicon waveguide components.
%K flame hydrolysis deposition
%K silica
%K GeO 2
%K refractive index
%K optical waveguide<br>火焰水解
%K SiO2
%K GeO2
%K 折射率
%K 光波导
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=B6E2C09CA32A61B3&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=B31275AF3241DB2D&sid=8B1FE194AD66DC3D&eid=2E4E3741E8FB64E9&journal_id=1674-4926&journal_name=半导体学报&referenced_num=3&reference_num=9