%0 Journal Article
%T A Study of Catalyst and Technology of Deep-UV Development-Free Photolithography<br>远紫外无显影光刻的催化剂及工艺探讨
%A Han Jieping/Microelectronics Research
%A Development Centre
%A Chinese Academy of Sciences
%A Beijing Hou Haoqing/Microelectronics Research
%A Development Centre
%A Chinese Academy of Sciences
%A Beijing
%A <br>韩阶平
%A 侯豪情
%J 半导体学报
%D 1990
%I 
%X A new catalyst has been developed.It consists of common organic compound (For examplemethyl violet etc.), CMPS resin and certain solvent.Experiments of the catalyst havebeen done with deep-UV exposure.The results demonstrate that sensitivity and resolution ofthe catalyst film are very high.The etching rate of SiO_2 increases due to the coating of thecatalyst.
%K Deep-UV Photolithography
%K Development-free photolithography Catalyst<br>远紫外
%K 无显影
%K 光刻
%K 催化剂
%K 工艺
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=11416BDFEA338275&yid=8D39DA2CB9F38FD0&vid=708DD6B15D2464E8&iid=DF92D298D3FF1E6E&sid=DEBDB7F30FBA7F9B&eid=64808317C39DF331&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=6