%0 Journal Article
%T Deposition of ITO Films in Low Temperature Plasma<br>低温等离子体反应沉积ITO膜的研究
%A Jia Yongxin/Luminescence Lab
%A Hebei UniversityYang Zhiping/Luminescence Lab
%A Hebei UniversityXie Xiaoyang/Luminescence Lab
%A Hebei UniversityLi Zhiqiang/Luminescence Lab
%A Hebei University
%A <br>贾永新
%A 杨志平
%A 谢晓阳
%A 李志强
%J 半导体学报
%D 1991
%I 
%X The deposition process of ITO films in low temperature plasma is studied.Uniform andcompact ITO films have been obtained.The optimum deposition conditions are established,and the experimental results are discussed qualitatively.
%K ITO films
%K Low temperature plasma
%K Reactive deposition<br>ITO膜
%K 低温
%K 等离子体
%K 沉积
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=86984D6D5CACC5EC&yid=116CB34717B0B183&vid=59906B3B2830C2C5&iid=CA4FD0336C81A37A&sid=95D537AC89B28832&eid=0401E2DB1F51F8DE&journal_id=1674-4926&journal_name=半导体学报&referenced_num=1&reference_num=6