%0 Journal Article
%T Important Works About Rules in Rules-Based Optical Proximity Correction<br>基于规则的光学邻近矫正中规则的相关处理(英文)
%A Shi Rui
%A Cai Yici
%A Hong Xianlong
%A Wu Weimin
%A Yang Changqi
%A <br>石蕊
%A 蔡懿慈
%A 洪先龙
%A 吴为民
%A 杨长旗
%J 半导体学报
%D 2002
%I 
%X Considering the efficiency and veracity of rules based optical proximity correction (OPC),the importance of rules in rules based OPC is pointed out.And how to select,to construct and to apply more concise and practical rules base is disscussed.Based on those ideas,four primary rules are suggested.Some data resulted in rules base are shown in table.The patterns on wafer are clearly improved by applying these rules to correct mask.OPCL,the automatic construction of the rules base is an important part of the whole rules based OPC system.
%K optical lithography
%K optical proximity correction
%K rules
%K base<br>光刻
%K 光学邻近矫正
%K 规则库
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=BAE073338F7E2DFC&yid=C3ACC247184A22C1&vid=EA389574707BDED3&iid=DF92D298D3FF1E6E&sid=80BBC722D530DB8D&eid=C19D5524C51D7FE4&journal_id=1674-4926&journal_name=半导体学报&referenced_num=6&reference_num=7