%0 Journal Article
%T Determination of Trace Metallic Impurities in High-Purity Gases<br>高纯气体中痕量金属杂质的测定
%A Cui Xianhang/Institute of Semiconductors
%A Academia Sinica
%A BeijingXu Xuemin/Institute of Semiconductors
%A Academia Sinica
%A BeijingYan Xingtian/Institute of Semiconductors
%A Academia Sinica
%A BeijingLang Wenhui/Institute of Semiconductors
%A Academia Sinica
%A Beijing
%A <br>崔仙航
%A 徐学敏
%A 严性天
%A 郎文卉
%J 半导体学报
%D 1989
%I 
%X Method for determination of trace metallic impurites in high-purity N_2, H_2, HCl,NH_3,B_2H_6,SiH_4, AsH_3 and pH_3 by flameless atomic absorption spectrometry havebeen established. The method is sensitive and simple, and satisfies the requirementof production.
%K Determinaton of trace metallic impurites
%K High-purity gases
%K Flameless atomic absorption spectrometry<br>高纯气体
%K 痕量金属
%K 杂质
%K 测定
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=EC847AD4CAA69DB5&yid=1833A6AA51F779C1&vid=F3090AE9B60B7ED1&iid=59906B3B2830C2C5&sid=D4A72ABDCEDCE1BD&eid=9822743C2D2BE348&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=3