%0 Journal Article
%T Application of Indentation Test Method in Investigating Adhesion Properties of Chemical Vapor Deposited Diamond Films<br>用压痕试验法研究CVD金刚石膜的粘附性能
%A KUANG Tong-Chun
%A LIU Zheng-Yi
%A ZHOU Ke-Song
%A DAI Ming-Jiang
%A WAN De-Zheng
%A <br>匡同春
%A 刘正义
%A 周克崧
%A 代明江
%A 王德政
%J 无机材料学报
%D 1998
%I Science Press
%X The feasibility of using the indentation test method to evaluate the adhesion property of chemical vapor deposited diamond film was investigated initially on the basis of observations and analyses of the crackillg or delamination ways of diamond films under indentation. Tile critical load for lateral crack initiation or peeling-off (Pc,) and the cracking resistance (dP/dX), two useful adhesion parameters, were used to characterize the adhesion properties of diamond films synthesized by various pretreatment methods and deposition process parameters. The relationships between adhesion properties and methane concentrations, deposition pressllres, deposition powers and residual stresses were studied. Adhesion properties of diamond films call be improved using proper pretreatment of substrate surface, suitable methane concentration, lower deposition pressure and higher deposition power.
%K indentation test method
%K CVD diamond film
%K adhesion property
%K residual stress<br>压痕试验法
%K CVD金刚石膜
%K 粘附性能
%K 残余应力
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=EB290F7852E805ED6CDE38D06A733D1C&yid=8CAA3A429E3EA654&vid=FC0714F8D2EB605D&iid=CA4FD0336C81A37A&sid=06EA2770E96C5402&eid=869807E2D7BED9EC&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=5&reference_num=11