%0 Journal Article
%T Etching of CVD Diamond Thick Films by Rare-earth Compound Ink<br>稀土化合物浆料对CVD金刚石厚膜的刻蚀
%A WANG Jia-Yu
%A JIN Ai-Zi
%A BAI Yi-Zhen
%A JI Hong
%A JIN Ceng-Sun
%A <br>王佳宇
%A 金爱子
%A 白亦真
%A 纪红
%A 金曾孙
%J 无机材料学报
%D 2002
%I Science Press
%X CVD diamond with high electrical, optical and thermal quality has been used in many applications. However, its inert chemical nature and high temperature stability make it difficult to be processed. A highly available etching technique compatible with existing diamond processing is desirable. In this paper, CVD diamond thick films were etched with rare-earth compound ink prepared by the authors. The etching process is taken in the atmosphere at a temperature below the oxidation temperature of diamond. The technique uses inexpensive and safe rare-earth compound ink and the experimental results show that the processing is simple and efficient for polishing the CVD diamond thick films rapidly. The results were studied by SEM.
%K CVD diamond thick film
%K etching
%K rare-earth compound ink<br>CVD
%K 金刚石厚膜
%K 刻蚀
%K 稀土化合物浆料
%K 表面形貌
%K 生长表面
%K 镜面抛光效率
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=5FB606078EF516AC&yid=C3ACC247184A22C1&vid=BCA2697F357F2001&iid=CA4FD0336C81A37A&sid=9D453329DCCABB94&eid=0584DB487B4581F4&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=5&reference_num=4