%0 Journal Article
%T Micro-mechanical Properties and Micro-structure of Ar+ Ion Implanted Single-crystal Silicon<br>氩离子注入单晶硅表面的微观结构和微观力学性能研究
%A SUN Rong
%A XU Tao
%A KOU Guan-Tao
%A XUE Qun-Ji
%A <br>孙蓉
%A 徐洮
%A 寇冠涛
%A 薛群基
%J 无机材料学报
%D 2005
%I Science Press
%X The nano-scratch behaviors of Ar+ implanted single-crystal silicon were investigated by a nano indenter system, the micro-structure of the implanted layer was analyzed with TEM. The results show that Ar+ implantation of single-crystal silicon increases the critical load, the best dose is 1×1016ions/cm2. The mixed structure of micro-crystal and amorphous silicon is formed on the surface of Ar+ implanted single-crystal silicon. This contributes to increasing the ability of plastic deformation and to increasing the fracture toughness of single-crystal silicon.
%K single-crystal silicon
%K Ar+ implantation
%K nano-scratch
%K fracture toughness<br>单晶硅
%K 氩离子注入
%K 纳米划痕
%K 断裂韧性
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=F3EEB1508B6802FB&yid=2DD7160C83D0ACED&vid=A04140E723CB732E&iid=38B194292C032A66&sid=61000B595C9AE527&eid=50FF665B2730AEEC&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=2&reference_num=14