%0 Journal Article
%T Electrochemical Properties of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrode<br>掺磷四面体非晶碳薄膜电极的电化学伏安特性
%A LIU Ai-Ping
%A ZHU Jia-Qi
%A HAN Jie-Cai
%A HAN Xiao
%A WU Hua-Ping
%A <br>刘爱萍
%A 朱嘉琦
%A 韩杰才
%A 韩潇
%A 吴化平
%J 无机材料学报
%D 2007
%I Science Press
%X Phosphorus incorporated tetrahedral amorphous carbon (ta-C:P) film was deposited by a filtered cathodic vacuum arc technology with PH3 as the dopant source. The composition and structural characteristics were investigated by X-ray photoelectron spectroscope and Raman spectroscope, and the electrochemical behaviors of ta-C:P film were examined by cyclic voltammetry and differential pulse voltammetry. Results indicate that phosphorus implantation does not remarkably change the amorphous structure of the film but enhances the clustering of sp2 sites dispersed in sp3 skeleton and the evolution of structrual ordering. Ta-C:P film pretreated by acid exhibits a large electrochemical potential window and a low background current in H2SO4 solution, a considerable electrochemical activity toward Cl-, quick electrode response and a high signal for Cu2+ and Cd2+ analysis. These characteristics greatly demonstrate a potential application of conductive ta-C:P film as electrodes for analysis and treatment of trace metal ions in waste water.
%K filtered cathodic vacuum arc
%K phosphorus incorporated tetrahedral amorphous carbon<br>过滤阴极真空电弧
%K 掺磷四面体非晶碳
%K 电极
%K 伏安行为
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=2E98CB3C1A75BCF228085F9EDC14BD78&yid=A732AF04DDA03BB3&vid=BC12EA701C895178&iid=B31275AF3241DB2D&sid=0C7160AA184DEC96&eid=6B1D468AD7B8ADD8&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=0&reference_num=26