%0 Journal Article
%T Reactive Sputter Deposition of nc-TiN/a-Si3N4 Nanocomposite Films in a Magnetized Inductively Coupled Plasma
磁约束电感耦合等离子体增强反应溅射沉积nc-TiN/a-Si3N4纳米复合薄膜
%A FAN Qiu-Lin
%A ZHAO Hong-Yu
%A SONG Li-Xin
%A ZHANG Tao
%A HU Xing-Fang
%A
范秋林
%A 赵红雨
%A 宋力昕
%A 张涛
%A 胡行方
%J 无机材料学报
%D 2004
%I Science Press
%X A novel magnetized plasma CVD and PVD combined technique was developed aiming at synthesizing nanocomposite films. The nanocrystalline nc-TiN/amorphous a-Si3N4 nanocom-posite film was satisfactorily fabricated onto silicon wafer substrates by reactively sputtering a TiSi alloyed target in a magnetized inductively coupled radio-frequency argon/nitrogen plasma. Scanning electron microscopy (SEM), X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM) were utilized to characterize the film structurally and compositionally. XRD, XPS and HRTEM investigations evidently revealed that the film was nanocomposite consisting basically of ~3nm TiN nanocrystallites in an amorphous Si3N4 matrix.
%K nanocomposite films
%K magnetized plasma
%K titanium nitride
%K silicon nitride
纳米复合薄膜
%K 磁束缚等离子体
%K 氮化钛
%K 氮化硅
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=3F85D9438E11A413&yid=D0E58B75BFD8E51C&vid=2A8D03AD8076A2E3&iid=94C357A881DFC066&sid=4AB97D697AC3192E&eid=3395C64999261B75&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=1&reference_num=29