%0 Journal Article
%T Distribution and Content of Hydrogen in DLC Films Prepared by Plasma Based Pulsed Bias Deposition<br>等离子体基脉冲偏压沉积DLC膜的氢分布和氢含量
%A XIA Li-Fang
%A SUN Ming-Ren
%A <br>夏立芳
%A 孙明仁
%J 无机材料学报
%D 2002
%I Science Press
%X The distribution and content of hydrogen in DLC films prepared by plasma based pulsed bias deposition were characterized systematically by nuclear reaction analysis (NRA). It was found that the DLC films with low hydrogen content can be obtained by plasma based bias deposition technique. The range of hydrogen content in DLC films is about 6at% to 17at%, and the hydrogen distribution is equalization along the depth of films. With decrease in plasma density and ionizability, the hydrogen contents in DLC films increase, however, the segregation of hydrogen in DLC films is promoted by hydrogen gas introduced into the working gas. The dehydrogenation is promoted obviously by the energetic ions bombardment on growth surface.
%K DLC film
%K hydrogen distribution
%K hydrogen content<br>等离子体
%K 脉冲偏压沉积
%K DLC膜
%K 氢分布
%K 氢含量
%K 类金刚石膜
%K 核反应分析
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=66607B1EA36BAD97&yid=C3ACC247184A22C1&vid=BCA2697F357F2001&iid=E158A972A605785F&sid=583C993D4E08F5CE&eid=DBEE434FCBFED297&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=0&reference_num=10