%0 Journal Article
%T Research of subwavelength grating based on multilayer films structure<br>基于多层膜结构的亚波长光栅研究
%A Liang Gao-Feng
%A Zhao Qing
%A Chen Xin
%A Wang Chang-Tao
%A Zhao Ze-Yu
%A Luo Xian-Gang
%A <br>梁高峰
%A 赵青
%A 陈欣
%A 王长涛
%A 赵泽宇
%A 罗先刚
%J 物理学报
%D 2012
%I 
%X Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.
%K suface plasmon
%K super-resolution imaging
%K nanolithography technique<br>表面等离子体
%K 超分辨成像
%K 纳米光刻技术
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=78F360FC29C479110083F67F2623A75B&yid=99E9153A83D4CB11&vid=1D0FA33DA02ABACD&iid=F3090AE9B60B7ED1&sid=C66CD8438857596E&eid=C66CD8438857596E&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=19