%0 Journal Article
%T Lower Gas Pressure Enhanced Diamond Nucleation on Alumina by Microwave Plasma Chemical Vapor Deposition
金刚石薄膜在氧化铝陶瓷上低压成核
%A WANG Zhi-Ming
%A XIA Yi-Ben
%A YANG Ying
%A FANG Zhi-Jun
%A WANG Lin-Jun
%A JU Jian-Hua
%A FAN Yi-Min
%A ZHANG Wei-Li
%A
王志明
%A 夏义本
%A 杨莹
%A 方志军
%A 王林军
%A 居建华
%A 范轶敏
%A 张伟丽
%J 无机材料学报
%D 2002
%I Science Press
%X Under lower gas pressure, the high-density nucleation of diamond films on alumina was successfully achieved by microwave plasma-enhanced chemical vapor deposition (MPCVD). It was found that the nucleation density increased with the decreases of gas pressure. Based on these results, a kinetic model for diamond nucleation in MPCVD system was proposed. The critical gas pressure corresponding to the highest nucleation density was also discussed.
%K diamond film
%K MPCVD
%K alumina substrates
%K gas pressure
%K nucleation
金刚石薄膜
%K MPCVD
%K 氧化铝陶瓷
%K 系统压强
%K 成核
%K 化学气相沉积
%K 集成电路
%K 基片
%K 动力学
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=9E7B768C0D35A280&yid=C3ACC247184A22C1&vid=BCA2697F357F2001&iid=E158A972A605785F&sid=849F08713EB6820A&eid=BDEE8BA20F4733DB&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=1&reference_num=9