%0 Journal Article %T Lower Gas Pressure Enhanced Diamond Nucleation on Alumina by Microwave Plasma Chemical Vapor Deposition
金刚石薄膜在氧化铝陶瓷上低压成核 %A WANG Zhi-Ming %A XIA Yi-Ben %A YANG Ying %A FANG Zhi-Jun %A WANG Lin-Jun %A JU Jian-Hua %A FAN Yi-Min %A ZHANG Wei-Li %A
王志明 %A 夏义本 %A 杨莹 %A 方志军 %A 王林军 %A 居建华 %A 范轶敏 %A 张伟丽 %J 无机材料学报 %D 2002 %I Science Press %X Under lower gas pressure, the high-density nucleation of diamond films on alumina was successfully achieved by microwave plasma-enhanced chemical vapor deposition (MPCVD). It was found that the nucleation density increased with the decreases of gas pressure. Based on these results, a kinetic model for diamond nucleation in MPCVD system was proposed. The critical gas pressure corresponding to the highest nucleation density was also discussed. %K diamond film %K MPCVD %K alumina substrates %K gas pressure %K nucleation
金刚石薄膜 %K MPCVD %K 氧化铝陶瓷 %K 系统压强 %K 成核 %K 化学气相沉积 %K 集成电路 %K 基片 %K 动力学 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=9E7B768C0D35A280&yid=C3ACC247184A22C1&vid=BCA2697F357F2001&iid=E158A972A605785F&sid=849F08713EB6820A&eid=BDEE8BA20F4733DB&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=1&reference_num=9