%0 Journal Article
%T Photo-detachment of hydrogen negative ion in a magnetic field near a dielectric surface<br>氢负离子在磁场和电介质表面附近光剥离的研究
%A Tang Tian-Tian
%A Wang De-Hu
%A Huang Kai-Yun
%A Wang Shan-Shan
%A <br>唐田田
%A 王德华
%A 黄凯云
%A 王姗姗
%J 物理学报
%D 2012
%I 
%X Using the closed orbit theory, we study the photo-detachment of H- in a magnetic field near a dielectric surface. The photo-detachment cross section of this system is also derived and calculated. It is found that the photo-detachment cross section is not only related to the magnetic field strength, but also depends on the dielectric constant. For a given ion-surface distance and dielectric constant, with the increase of the magnetic field strength, the number of the closed orbits increases greatly and the oscillatory structure in the photo-detachment cross section becomes much more complicated. On the other hand, for a given magnetic field strength, the dielectric constant also has a great influence on the photo-detachment process of negative ion. Above the ionization threshold, the photo-detachment cross section becomes oscillatory. With the increase of the dielectric constant, the oscillatory structure in the cross-section becomes much more complicated. Therefore we can control the photo-detachment of negative ion by changing the magnetic field strength and the dielectric constant. This study provides a new understanding of the photo-detachment process of negative ion in the presence of external fields and surfaces.
%K photodetachment
%K closed orbit theory
%K dielectric surface
%K magnetic field<br>光剥离
%K 闭合轨道理论
%K 电介质表面
%K 磁场
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=790A9358A1C1D655D43C065F8B32A478&yid=99E9153A83D4CB11&vid=1D0FA33DA02ABACD&iid=B31275AF3241DB2D&sid=B4DB9BDE85BCF832&eid=B4DB9BDE85BCF832&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=21