%0 Journal Article
%T Effects of hydrogen flux on aluminum doped zinc thin films by pulsed magnetron sputtering<br>H2气对脉冲磁控溅射铝掺杂氧化锌薄膜性能的影响
%A Li Lin-Na
%A Chen Xin-Liang
%A Wang Fei
%A Sun Jian
%A Zhang De-Kun
%A Geng Xin-Hua
%A Zhao Ying
%A <br>李林娜
%A 陈新亮
%A 王斐
%A 孙建
%A 张德坤
%A 耿新华
%A 赵颖
%J 物理学报
%D 2011
%I 
%X Aluminum doped zinc oxide(AZO) thin films are prepared by pulsed magnetron sputtering in pure argon gas.In order to improve the properties of AZO thin films,we add hydrogen gas into vacuum during sputtering.High purity ceramic ZnO:Al2O3 target and hydrogen gas at various flow rates are used as source materials.The microstructure,the surface information,the optical and electrical properties of AZO/H film are investigated.The crystallization,the Hall mobility and the transmission between 400 nm and 1100 nm ar...
%K zinc oxide
%K H2 flow rates
%K magnetron sputtering
%K solar cell<br>氧化锌
%K 氢气流量
%K 磁控溅射
%K 太阳电池
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=9880CD65C317F63D550B4AE15F5A51E7&yid=9377ED8094509821&vid=BFE7933E5EEA150D&iid=B31275AF3241DB2D&sid=48399BBDDD50EE16&eid=48399BBDDD50EE16&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=16