%0 Journal Article
%T Research on characteristics degradation of n-metal-oxide-semiconductor field-effect transistor induced by hot carrier effect due to high power microwave<br>高功率微波作用下热载流子引起n型金属-氧化物-半导体场效应晶体管特性退化研究
%A You Hai-Long
%A Lan Jian-Chun
%A Fan Ju-Ping
%A Jia Xin-Zhang
%A Zha Wei
%A <br>游海龙
%A 蓝建春
%A 范菊平
%A 贾新章
%A 查薇
%J 物理学报
%D 2012
%I 
%X High power microwave (HPM) can disrupt the normal work of electronic systems through the effect of HPM on semiconductor devices. In this paper, the physical process and the physical model of the characteristic degradation of n-metal-oxide-semiconductor field-effect transistor (nMOSFET) induced by HPM are introduced. In device simulation results, the output characteristic curve of nMOSFET shows that HPM can induce the degradation of the characteristics of device, including the forward drift of threshold voltage, and the reduction of saturation current and transconductance. Based on the process and the model introduced in this paper, the voltage pulse generated by HPM makes nMOSFET be in depletion status and hot carrier increase; then the effect of hot carrier results in the characteristic degradation of device. The experimental result of MOS injected HPM shows the changes of output characteristics and model parameters are consistent with the device simulation results, proving that the physical process and the physical model introduced in the paper are correct.
%K high power microwave
%K n-metal-oxide-semiconductor field-effect transistor
%K hot carrier
%K characteristics degradation<br>高功率微波
%K n型金属-氧化物-半导体场效应晶体管
%K 热载流子
%K 特性退化
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=78F360FC29C4791172B46EA3356891A8&yid=99E9153A83D4CB11&vid=1D0FA33DA02ABACD&iid=F3090AE9B60B7ED1&sid=7D58D856BC36DA35&eid=7D58D856BC36DA35&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=13