%0 Journal Article
%T Pore structure determination of mesoporous SiO2 thin films by slow positron annihilation spectroscopy<br>介孔SiO2薄膜孔结构的慢正电子技术表征
%A Wang Qiao-Zhan
%A Yu Run-Sheng
%A Qin Xiu-Bo
%A Li Yu-Xiao
%A Wang Bao-Yi
%A Jia Quan-Jie
%A <br>王巧占
%A 于润升
%A 秦秀波
%A 李玉晓
%A 王宝义
%A 贾全杰
%J 物理学报
%D 2009
%I 
%X Mesoporous silica thin films with different pore shapes were prepared by evaporation induced self-assembly method. The synchrotron radiation x-ray reflectivity and slow positron annihilation techniques were used to characterize the pore structures. The results indicated that with increase of the spin-coating speed, the pore structure transformed from 3-D cubic to 2-D hexagonal, the average porosity also decreased. The correlation of the film structures and positron annihilation parameters was songht for with FT-IR spectroscopy and isotropic inorganic pore contraction model.
%K synchrotron radiation
%K x-ray reflectivity
%K Doppler broadening
%K positronium time-of-flight<br>同步辐射，
%K X射线反射率，
%K Doppler展宽，
%K 正电子素飞行时间谱
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=88ABEA1C5D54BC2BF5B19B44855E4950&yid=DE12191FBD62783C&vid=9FFCC7AF50CAEBF7&iid=59906B3B2830C2C5&sid=4F4FB6601BA924E8&eid=33026C7412CAA2B5&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=0