%0 Journal Article
%T Composition,microstructure and properties of C-N-V films prepared by pulsed bias arc ion plating<br>脉冲偏压电弧离子镀C-N-V薄膜的成分、结构与性能
%A Li Hong-Kai
%A Lin Guo-Qiang
%A Dong Chuang
%A <br>李红凯
%A 林国强
%A 董闯
%J 物理学报
%D 2010
%I 
%X High quality C-N-V films with different compositions were prepared on cemented carbide substrate using pulsed bias arc ion plating. The surface morphology, composition, microstructure and properties of C-N-V films were investigated by scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy, Raman spectra, grazing incident X-ray diffraction, and nano-indentation, respectively. The results show that the deposited films were nanocomposite films with VN nanocrystalline phase imbedded within diamond-like carbon(DLC) amorphous matrix. The hardness and elastic modulus, which are closely related to the composition and structure of the film, first increase and then decrease with increasing V and N contents and have the highest values of 36.8 and 569.7 GPa exceeding that of pure DLC film prepared under the same condition when nitrogen content is 20.4% and vanadium content is 21.8%. The variation of V and N contents has significant influence on the phase structure, relative concentration of VN crystalline phase and DLC amorphous phase, and induces the formation of nano-diamond phase, hence has great effect on the properties of the films.
%K C-N-V films
%K diamond-like carbon films
%K nanocomposite film
%K arc ion plating<br>C-N-V薄膜
%K 类金刚石薄膜
%K 纳米复合薄膜
%K 电弧离子镀
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=9235610D4A4FEBB637BCFB6206417548&yid=140ECF96957D60B2&vid=6AC2A205FBB0EF23&iid=B31275AF3241DB2D&sid=C3A4D4F17EFA3F0C&eid=01BB3C6440002FD1&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=25