%0 Journal Article
%T Characteristics of Nb2 O5 thin films deposited by ion beam sputtering<br>离子束溅射制备Nb2O5光学薄膜的特性研究
%A Yuan Wen-Jia
%A Zhang Yue-Guang
%A Shen Wei-Dong
%A Ma Qun
%A Liu Xu
%A <br>袁文佳
%A 章岳光
%A 沈伟东
%A 马群
%A 刘旭
%J 物理学报
%D 2011
%I 
%X Optical properties, stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering (IBS) are investigated, and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed. The results show that with different parameters of assisted ion source, the refractive index changes from 2.310 to 2.276 and residual stress varies from -281MPa to -152 MPa. The extinction coefficient of Nb2O5 can be under 10-4, and the surface is very smooth in an optimum deposition condition. Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition (IAD).
%K Nb2O5 thin films
%K ion beam sputtering
%K optical properties
%K stress<br>Nb2O5薄膜
%K 离子束溅射
%K 光学特性
%K 应力
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=BE045A2F438F614E993B36A70EAA7485&yid=9377ED8094509821&vid=BFE7933E5EEA150D&iid=E158A972A605785F&sid=8243B77967FFD12E&eid=710C005323C0774A&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=17