%0 Journal Article
%T Study of the characteristics of organic thin film transistors with phenyltrimethoxysilane buffer under low gate modulation voltage
低栅极电压控制下带有phenyltrimethoxysilane单分子自组装层的有机薄膜晶体管场效应特性研究
%A Yuan Guang-Cai
%A Xu Zheng
%A Zhao Su-Ling
%A Zhang Fu-Jun
%A Xu N
%A Sun Qin-Jun
%A Xu Xu-Rong
%A
袁广才
%A 徐征
%A 赵谡玲
%A 张福俊
%A 许娜
%A 孙钦军
%A 徐叙瑢
%J 物理学报
%D 2009
%I
%X 制作了底栅极顶接触有机薄膜晶体管器件,60 nm的pentacene被用作有源层,120 nm热生长的SiO2作为栅极绝缘层.通过采用不同自组装修饰材料对器件的有源层与栅极绝缘层之间的界面进行修饰,如octadecyltrichlorosilane (OTS),phenyltrimethoxysilane (PhTMS),来比较界面修饰层对器件性能的影响.同时对带有PhTMS修饰层的OTFTs器件低栅极电压调制下的场效应行为及其载流子的传输机理进行研究.结果得到,当|V
%K organic thin-film transistor
%K self-assembled monolayer
%K field-effect mobility
%K low gate modulated voltage
有机薄膜晶体管,
%K 自组装单分子层,
%K 场效应迁移率,
%K 低栅极调制电压
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=1DD616FE031938F809F542CF0D0059C9&yid=DE12191FBD62783C&vid=9FFCC7AF50CAEBF7&iid=DF92D298D3FF1E6E&sid=A6D857C9E68D3F3F&eid=A6CCD21D6E55ABDD&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=0