%0 Journal Article
%T Investigation of filling factor in In0.53Ga0.47As/In0.52Al0.48As quantum wells with two occupied subbands
两个子带占据的In0.53Ga0.47As/In0.52Al0.48As量子阱中填充因子的变化规律
%A Shang Li-Yan
%A Lin Tie
%A Zhou Wen-Zheng
%A Guo Shao-Ling
%A Li Dong-Lin
%A Gao Hong-Ling
%A Cui Li-Jie
%A Zeng Yi-Ping
%A Chu Jun-Hao
%A
商丽燕
%A 林 铁
%A 周文政
%A 郭少令
%A 李东临
%A 高宏玲
%A 崔利杰
%A 曾一平
%A 褚君浩
%J 物理学报
%D 2008
%I
%X 研究了低温(15K)和强磁场(0—13T)条件下, InP基In053Ga047As/In052Al048As量子阱中电子占据两个子带时填充因子随磁场的变化规律.结果表明,在电子自旋分裂能远小于朗道能级展宽的情况下,如果两个子带分裂能是朗道分裂能的整数倍时,即ΔE21=kωc(其中k为整数),填充因子为偶数;当两个子带分裂能为朗道分裂能的半奇数倍时,即ΔE21=(2k+1)ωc/2,填充因子出现奇数.
%K In053Ga047As/In052Al048As量子阱
%K 填充因子,磁输运
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=DC8A11D95DEC3DE88244F6BAD4136401&yid=67289AFF6305E306&vid=11B4E5CC8CDD3201&iid=B31275AF3241DB2D&sid=819E86D947B0AD21&eid=77056AE97DF6A494&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=0