%0 Journal Article
%T Low-loss 193nm anti_reflection coatings<br>低损耗193 nm增透膜
%A Shang Shu-Zhen
%A Shao Jian-Da
%A Fan Zheng-Xiu
%A <br>尚淑珍
%A 邵建达
%A 范正修
%J 物理学报
%D 2008
%I 
%X The optical constants suitable for designing and depositing 193nm AR coatings were calculated, and 193nm AR coatings were designed, produced and characterized on the basis of the calculated results. It was found that the extinction loss of the substrate material had such an important effect that when it was beyond a certain level the designed transmittance could not reach the ideal value. The designed and manufactured results of the single-surface AR coatings revealed that scattering loss began to play the key role when the absorbance loss decreased to a certain extent. High performance 193nm AR coatings with residual reflectance lower than 0.2% have been prepared by the resistant boat evaporation method.
%K 193 nm
%K AR coatings
%K optical loss
%K reflection<br>193nm，
%K 增透膜，
%K 光学损耗，
%K 剩余反射率
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=1E0ADBB9558757B85197BB7ECA9B917D&yid=67289AFF6305E306&vid=11B4E5CC8CDD3201&iid=38B194292C032A66&sid=B0718637E678B1AB&eid=A93AF80BA961E8FF&journal_id=1000-3290&journal_name=物理学报&referenced_num=1&reference_num=12