%0 Journal Article
%T Measurement of thickness and refractive index of Zn1-xMgxO film grown on sapphire substrate by molecular beam epitaxy<br>分子束外延法在Sapphire衬底上生长的Zn1－xMgxO薄膜折射率及厚度的测试
%A Yan Feng-Ping
%A Zheng Kai
%A Wang Lin
%A Li Yi-Fan
%A Gong Tao-Rong
%A Jian Shui-Sheng
%A K Ogat
%A K Koike
%A S Sas
%A M Inoue
%A M Yano
%A <br>延凤平
%A 郑 凯
%A 王 琳
%A 李一凡
%A 龚桃荣
%A 简水生
%A 尾形健一
%A 小池一步
%A 佐佐诚彦
%A 井上正崇
%A 矢野满明
%J 物理学报
%D 2007
%I 
%X The thickness and refractive index of Zn1-xMgxO film grown on A-sapphire substrate by molecular beam epitaxy were measured by ellipsometry. Combined with Mg content measured by inductively coupled plasma (ICP), the curves showing the relationships of thickness with film growth condition and the refractive index with the Mg content in the film were deduced by numerical analysis, which may serve as a theoretical basis for controlling the thickness and the refractive index in Zn1-xMgxO film growth process.
%K ZnMgO film
%K ellipsometry
%K refractive index
%K molecular beam epitaxy (MBE)<br>ZnMgO薄膜，
%K 偏振光椭圆率测量仪，
%K 折射率，
%K 分子束外延(MBE)
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=AF47124DF5FA7169&yid=A732AF04DDA03BB3&vid=014B591DF029732F&iid=DF92D298D3FF1E6E&sid=8D8268632EA08FFA&eid=54353D11BB9C1A6C&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=15