%0 Journal Article
%T Surface roughening and growth mode transition of polycrystalline thin films<br>多晶薄膜表面粗化与生长方式转变
%A Yang Ji-Jun
%A Xu Ke-Wei
%A <br>杨吉军
%A 徐可为
%J 物理学报
%D 2007
%I 
%X Surface roughening of Cu and Ta polycrystalline thin films deposited by magnetron sputtering at different homologous temperature Ts/Tm (Ts and Tm are the substrate temperature and the material melting point, respectively) have been studied using atomic force microscopy. With increasing Ts/Tm, the surface roughness of the films increased and growth exponent first increased and then decreased. The observed temperature dependence of growth exponent indicates a transition of growth modes from random growth at lower Ts/Tm through surface diffusion-dominated growth at intermediate Ts/Tm to anomalous scaling growth at higher Ts/Tm. We also found that the surface roughening of the films reflects the anomalous scaling behavior when the value of Ts/Tm is lower than 0.41, which implies that the boundary diffusion mechanism plays an important role in the scaling behavior of surface roughening.
%K polycrystalline films
%K surface roughening
%K temperature
%K growth<br>多晶薄膜
%K 表面粗化
%K 温度
%K 生长
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=46960A6E9C16D19C&yid=A732AF04DDA03BB3&vid=014B591DF029732F&iid=0B39A22176CE99FB&sid=CEBE8025959B35C7&eid=CA10C709B736BBEA&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=26