%0 Journal Article %T Study on the microstructure and properties of (Ti, Al)N film deposited by pulsed high energy density plasma
脉冲高能量密度等离子体沉积(Ti, Al)N薄膜组织及其性能研究 %A Liu Yuan-Fu %A Han Jian-Min %A Zhang Gu-Ling %A Wang Jiu-Li %A Chen Guang-Liang %A Li Xue-Ming %A Feng Wen-Ran %A Fan Song-Hu %A Liu Chi-Zi %A Yang Si-Ze %A
刘元富 %A 韩建民 %A 张谷令 %A 王久丽 %A 陈光良 %A 李雪明 %A 冯文然 %A 范松华 %A 刘赤子 %A 杨思泽 %J 物理学报 %D 2005 %I %X Hard and corrosion resistance (Ti, Al)N film was deposited by pulsed high energy density plasma on the substrate of 0 45% C carbon steel at ambient temperature. The microstructure of the film has been investigated by SEM,XRD,XPS and AES. The nanohardness of the film was tested by nanoindentation tester. The corrosion resistance of the film was tested by potentiodynamic polarization in 0 5 mol /L H 2 SO 4 aqueous solution. The results indicate that the film mainly composed of (Ti, Al)N and a small amount of AlN. The nanohardness of the film approaches 26 GPa. The corrosion resistance of the film is improved by about one order of magnitude, compared with 1Cr18Ni9Ti austenitic stainless steel. %K pulsed high energy density plasma %K thin %K film %K nanohardness %K corossion resistance
脉冲高能量密度等离子体, %K 薄膜, %K 纳米硬度, %K 耐蚀性 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=24BC04F36F31221D&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=38B194292C032A66&sid=F1F469D6A2E9D130&eid=3BA4B6BD78D34019&journal_id=1000-3290&journal_name=物理学报&referenced_num=1&reference_num=11