%0 Journal Article
%T Study of the structural and optical properties of microcrystalline silicon film<br>微晶硅薄膜的结构及光学性质的研究
%A Gao Xiao-Yong
%A Li Rui
%A Chen Yong-Sheng
%A Lu Jing-Xiao
%A Liu Ping
%A Feng Tuan-Hui
%A Wang Hong-Juan
%A Yang Shi-E
%A <br>郜小勇
%A 李瑞
%A 陈永生
%A 卢景霄
%A 刘萍
%A 冯团辉
%A 王红娟
%A 杨仕娥
%J 物理学报
%D 2006
%I 
%X Using high-deposition-pressure technique, high-quality microcrystalline silicon film was prepared by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) combined with rapid thermal treatment. The volume fractions of the amorphous and microcrystalline phases and optical properties of microcrystalline silicon were carefully studied by Raman spectra, reflectance spectra and transmittance spectra. The results show a red shift of the absorption edge of microcrystalline silicon, which can be due to the increase in the volume fractions of the amorphous and microcrystalline phase and decrease in the band tail states.
%K microcrystalline silicon
%K Raman spectra
%K rapid thermal treatment
%K red shift<br>微晶硅
%K 拉曼光谱
%K 快速热处理
%K 红移
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=FCCCEBCB980CC0E0&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=CA4FD0336C81A37A&sid=10F298ED9F164662&eid=74011071555EB4E5&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=17