%0 Journal Article
%T Optical band gap of cubic boron nitride thin films deposited by sputtering<br>立方氮化硼薄膜的光学带隙
%A Deng Jin-Xiang
%A Wang Xu-Yang
%A Yao Qian
%A Zhou Tao
%A Zhang Xiao-Kang
%A <br>邓金祥
%A 汪旭洋
%A 姚倩
%A 周涛
%A 张晓康
%J 物理学报
%D 2008
%I 
%X 用射频溅射法在P型Si(100)衬底上沉积立方氮化硼(c-BN)薄膜,薄膜的成分由傅里叶变换红外谱标识,用紫外-可见分光光度计测量了c-BN薄膜的反射光谱,利用K-K(Kramers-Kroning)关系从反射谱计算出c-BN薄膜的光吸收系数,进而确定c-BN薄膜的光学带隙.对于立方相含量为55.4%的c-BN薄膜,光学带隙为5.38 eV.
%K cubic boron nitride thin films
%K optical band gap
%K Kramers-Kronig transform<br>立方氮化硼薄膜
%K 光学带隙
%K K-K关系
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=8243A6E8BB0C0D6942A3E0310659B820&yid=67289AFF6305E306&vid=11B4E5CC8CDD3201&iid=F3090AE9B60B7ED1&sid=E4DC8EE078F37894&eid=3870118F5793AA9A&journal_id=1000-3290&journal_name=物理学报&referenced_num=1&reference_num=0