%0 Journal Article
%T Fabrication of graphite nano-structures<br>人工裁剪制备石墨纳米结构
%A Liu ShouPeng
%A Zhou Feng
%A Jin AiZi
%A Yang HaiFang
%A Ma YongJun
%A Li Hui
%A Gu ChangZhi
%A Lv Li
%A Jiang Bo
%A Zheng QuanShui
%A Wang Sheng
%A Peng LianMao
%A <br>刘首鹏
%A 周 锋
%A 金爱子
%A 杨海方
%A 马拥军
%A 李 辉
%A 顾长志
%A 吕 力
%A 姜 博
%A 郑泉水
%A 王 胜
%A 彭练矛
%J 物理学报
%D 2005
%I 
%X Nano-sized graphite patterns were obtained by tailoring graphite sheets using different methods. With focused ion beam etching we are able to produce grooves of minimum width - 30 nm. However, at the edges of the grooves there deposit with Ga-C compound which prevents the easy cleavage of the graphite sheets. With electron beam lithography and reactive ion etching techniques we are able to produce graphite patterns of sizes down to 50 nm. Three different types of masks are tested, and the results are compared and discussed.
%K highly oriented pyrolytic graphite
%K focused ion beam etching
%K electron beam lithography
%K reactive ion etching<br>高定向热解石墨，
%K 聚焦离子束刻蚀，
%K 电子束曝光，
%K 反应离子刻蚀
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=87E69680A8E92F17&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=9CF7A0430CBB2DFD&sid=ECB2CB056E282150&eid=80EDE37390BE6173&journal_id=1000-3290&journal_name=物理学报&referenced_num=1&reference_num=8