%0 Journal Article
%T Fast fabrication of large-area nanopore arrays by FIB<br>FIB快速加工纳米孔点阵的新方法
%A Chen Lei-Ming
%A Li Pei-Gang
%A Fu Xiu-Li
%A Zhang Hai-Ying
%A Li L H
%A Tang Wei-Hua
%A <br>陈雷明
%A 李培刚
%A 符秀丽
%A 张海英
%A L. H. Li
%A 唐为华
%J 物理学报
%D 2005
%I 
%X Fabrication of nanopore arrays is of great importance in nanodevices manufacture and basic scientific research. Focused ion beam (FIB) and electron beam lithography (EBL) have been widely used for fabrication of nanostructures.However, it takes very long time to fabricate nanostructure patterns of large area. In this p aper we report a novel fast fabrication method for nanopore arrays of large area by FIB. Each pixel of predesigned BMP file is regarded as a fabrication dot. B y matching the pixel of the presigned BMP pattern with the required fabrication area, nanopore arrays of large area can be fabricated in a very short time.
%K focused ion beam
%K electron beam lithography
%K nanopore array<br>聚焦离子束，
%K 电子束曝光，
%K 纳米孔点阵
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=546BF6F85911675E&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=0B39A22176CE99FB&sid=90773C2285A2F0BB&eid=CD26609C367AC9C8&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=17