%0 Journal Article
%T Molds for nanoimprinting made by modified photoresist<br>改性光刻胶制备纳米压印模版
%A Chen Lei-Ming
%A Guo Yan-Feng
%A Guo Xi
%A Tang Wei-Hua
%A <br>陈雷明
%A 郭艳峰
%A 郭熹
%A 唐为华
%J 物理学报
%D 2006
%I 
%X The molds for nanoimprint is very important for nanoimprinting. Many hard materials have been used to make molds. But these materials are difficult to fabricate. In this paper we present a novel technique for making molds based on the modification of polymer by focused ion beam irradiation. This technique is very fast and simple. It can be used in many other domainus of nanofabrication.
%K nanoimprint
%K photoresist
%K focused ion beam
%K nano role array<br>纳米压印
%K 光刻胶
%K 聚焦离子束
%K 纳米孔阵列
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=F92A19CD84C5AAD8&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=59906B3B2830C2C5&sid=E707DE8C8A20A3F8&eid=97B4B37B97D436B9&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=11