%0 Journal Article
%T Thermal stability of magnetic tunnel junctions investigated by x-ray photoelectron spectroscopy<br>磁性隧道结热稳定性的x射线光电子能谱研究
%A Feng Yu-Qing
%A Zhao Kun
%A Zhu Tao
%A Zhan Wen-Shan
%A <br>冯玉清
%A 赵 昆
%A 朱 涛
%A 詹文山
%J 物理学报
%D 2005
%I 
%X We have studied the thermal stability of magnetic tunnel junctions with and without nano-oxide layer (NOL) using x-ray hpotoelectron spectroscopy (XPS). The con centration and chemical states of elements,in particular Mn,have been obtained b y angel-resolved XPS and peak decomposition technique.It is confirmed that Mn in the antiferromagnetic layer can diffuse into the pinned ferromagnetic layer and the insulating barrier layer when a magnetic tunnel junction without NOL is ann ealed at high temperature.However,the interdiffusion of Mn during the annealing process is suppressed by inserting a NOL between the antiferromagnetic and pinne d ferromagnetic layer,and then the thermal stability is improved.
%K magnetic tunnel junction
%K nano-oxide layer
%K x-ray photoelectron spe ctroscopy<br>磁性隧道结，
%K 纳米氧化层，
%K x射线光电子能谱
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=81ED010255331CDC&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=708DD6B15D2464E8&sid=4A94BE06EB7D4654&eid=84C74C63CD6982B5&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=20