%0 Journal Article
%T Mechanism of nodule growth in ion beam sputtering films<br>离子束溅射法薄膜生长中结瘤微缺陷的生长机理
%A Zhang Dong-Ping
%A Qi Hong-Ji
%A Shao Jian-D
%A Fan Rui-Ying
%A Fan Zheng-Xiu
%A <br>张东平
%A 齐红基
%A 邵建达
%A 范瑞瑛
%A 范正修
%J 物理学报
%D 2005
%I 
%X Zirconium single layer films were prepared by ion beam sputtering method. By using a novel designed substrate holder in pre planting seeds method, the growth process of the nodular defects in thin films was studied. With the help of high resolution optical microscopy and electron scanning microcopy, the phenomenon that the nodules nucleation exhibits fractal characters in their initial growth period was observed. By using the molecular dynamics theory and diffusion limited aggregation model of film growth, the fractal phenomenon of the nodule nucleation was well explained.
%K nodular defect
%K zirconium films
%K diffusion limited aggregation model<br>结瘤微缺陷，
%K 锆薄膜，
%K 扩散限制聚集模型
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=6DE82898DED759D7&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=38B194292C032A66&sid=09D89DB7E3DF529E&eid=79D108842269596A&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=12