%0 Journal Article
%T Microstructure and optical constants of sputtered Ag films of different thickness<br>磁控溅射不同厚度银膜的微结构及其光学常数
%A Sun Xi-Lian
%A Hong Rui-Jin
%A Qi Hong-Ji
%A Fan Zheng-Xiu
%A Shao Jian-Da
%A <br>孙喜莲
%A 洪瑞金
%A 齐红基
%A 范正修
%A 邵建达
%J 物理学报
%D 2006
%I 
%X Ag films with different thickness from 8.2nm to 107.2nm were prepared by DC sputtering deposition and analyzed by X-ray diffraction with the help of optimization program on computer. Microstructrue analysis shows that the films are made of fcc-Ag particles. With the increase of thickness, the mean size of Ag particles increases and the interplaner spacing decreases gradually. The optical constants computed by computer program shows that n value decreases quickly with the increasing thickness below 17.5nm and k value changes in reverse, and then go steadily when the thickness is larger than 17.5nm at the wavelength of 550nm.
%K DC sputtering deposition
%K Ag films
%K microstructrue
%K optical constants<br>直流溅射镀膜
%K 银膜
%K 微结构
%K 光学常数
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=F66B7D9FD0E65675&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=9CF7A0430CBB2DFD&sid=EDE15B863F6D5931&eid=CF1987027429C6D7&journal_id=1000-3290&journal_name=物理学报&referenced_num=4&reference_num=14