%0 Journal Article
%T Effects of charging at dielectric surfaces on the characteristics of the sheath for plasma immersion ion implantation<br>介质靶表面的充电效应对等离子体浸没离子注入过程中鞘层特性的影响
%A Li Xue-Chun
%A Wang You-Nian
%A <br>李雪春
%A 王友年
%J 物理学报
%D 2004
%I 
%X Using the one_dimensional dynamic sheath model, the effects of charging at a planar dielectric surface in plasma immersion ion implantation are studied. The temporal evolution of the sheath thickness, the effective potential at the surface of the dielectric and the ion dose accumulated on it are obtained for different plasma densities and dielectric thicknesses. The numerical results demonstrated that due to the charging effects, the plasma density has a profound impact on doping result during plasma immersion ion implantation, but the thickness of the dielectric has no significant effect on it.
%K plasma immersion ion implantation
%K pulse sheath
%K dielectric
%K charging effects<br>等离子体浸没离子注入
%K 脉冲鞘层
%K 绝缘介质
%K 充电效应
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=D9895D416C2D77A6&yid=D0E58B75BFD8E51C&vid=8E6AB9C3EBAAE921&iid=5D311CA918CA9A03&sid=F5D0A1CC082636E5&eid=E8DEC1A5DEE63AD8&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=11