%0 Journal Article
%T Near-field optical property of multi-layer dielectric gratings for pulse compressor<br>多层介质膜脉冲压缩光栅近场光学特性分析
%A Liu Shi-Jie
%A Shen Jian
%A Shen Zi-Cai
%A Kong Wei-Jin
%A Wei Chao-Yang
%A Jin Yun-Xia
%A Shao Jian-Da
%A Fan Zheng-Xiu
%A <br>刘世杰
%A 沈健
%A 沈自才
%A 孔伟金
%A 魏朝阳
%A 晋云霞
%A 邵建达
%A 范正修
%J 物理学报
%D 2006
%I 
%X Multi-layer dielectric gratings for pulse compressor in high-energy laser system must provide high diffraction efficiency. In addition, its laser induced damage property is critical for the system. Nonuniform optical near-field distribution of multi-layer dielectric gratings is one of the important factors to limit its laser induced damage threshold. Electric field distributions in the grating region and multi-layer film region are analyzed by using Fourier modal method. Effects of grating structure on peak magnitude of electric field in grating ridge are analyzed when the top layer material is HfO2 and SiO2, respectively. The results show that there exists an optimum top layer thickness, at which the peak magnitude of electric field within grating ridge is a minimum. And the peak electric field in the grating ridge can be reduced by designing top gratings with high aspect ratio structure when top layer thickness is increasing. Finally, the peak electric field in the grating ridge can also be reduced when the multi-layer dielectric grating is used at big incident angle.
%K diffractive optics
%K multi-layer dielectric gratings
%K Fourier modal method
%K laser induced damage threshold<br>衍射光学
%K 多层介质膜光栅
%K 模式理论
%K 损伤阈值
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=FBAD22A34BDA178A&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=9CF7A0430CBB2DFD&sid=3986A42ED787F2E8&eid=1194DF4EBE155929&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=10