%0 Journal Article
%T Fabrication of nanoimprint mold by multilayer film deposition technique<br>利用多层膜生长技术制备纳米印章模板
%A Zhang Yong-Jun
%A Li Wei
%A Meng Xiang-Dong
%A Yang Jing-Hai
%A Hua Zhong
%A Li Wei
%A Xu Jun
%A Huang Xin-Fan
%A Chen Kun-Ji
%A <br>张永军
%A 李 卫
%A 孟祥东
%A 杨景海
%A 华 中
%A 李 伟
%A 徐 骏
%A 黄信凡
%A 陈坤基
%J 物理学报
%D 2006
%I 
%X To overcome the difficulties in the fabrication of the nanoimprint mold with linewidth smaller than 50 nm, we deposited a-Si/SiN~ multilayer films in plasma enhanced chemical vapor deposition system and then prepared the relieo-nanomold on the cleaved section of the multilayer films by selectively etching or reactive ion etching process. Due to the slow deposition rate, the thickness of the sublayer, and therefore the size of the strips and grooves can be controlled on the nanometer scale by altering deposition time. The smallest width we get by now is the 20 nm strips and 20 nm pitches, which is better than that fabricated by electron beam lithography.
%K nanoimprint mold
%K multilayer film deposition technique<br>纳米印章模板
%K 多层膜生长技术
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=8B40DBE0096EABD7&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=E158A972A605785F&sid=CAE000D2C4E36F22&eid=59C77779BF483289&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=10