%0 Journal Article
%T Control of coercivity of iron films deposited on porous silicon substrates<br>矫顽力可调的多孔硅基Fe膜
%A Qiu Xue-Jun
%A Zhang Yun-Peng
%A He Zheng-Hong
%A Bai Lang
%A Liu Guo-Lei
%A Wang Yue
%A Chen Peng
%A Xiong Zu-Hong
%A <br>邱学军
%A 张云鹏
%A 何正红
%A 白浪
%A 刘国磊
%A 王跃
%A 陈鹏
%A 熊祖洪
%J 物理学报
%D 2006
%I 
%X Porous silicon (PS) with different porosity was obtained by anode electrochemical etching of boron-doped Si (100); the as-etched samples were then covered with Fe films by magnetron sputter technique. Analysis of surface profile and structural investigation were done by scanning tunneling microscopy and X-ray diffraction. Magneto-optical Kerr effect was employed to measure the hysteresis loops of the iron films sputtered onto PS and the reference sample on the Si substrate. The coercivity of the PS-based Fe films is larger than that of the Si-based ones, and increases with the porosity of the PS substrate. As for the PS-based samples with the same porosity, the coercivity of Fe films decreases with their thicknesses in a certain range. We found that the spongelike structure of PS can be effectively used to control the coercivity of iron films on the PS substrates.
%K porous silicon
%K spongelike structure
%K iron films
%K coercivity<br>多孔硅
%K 海绵状结构
%K Fe薄膜
%K 矫顽力
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=18AFC725569E21AC&yid=37904DC365DD7266&vid=E514EE58E0E50ECF&iid=708DD6B15D2464E8&sid=53B73BC0DB565D83&eid=C2DC9FF2809C344B&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=41