%0 Journal Article
%T Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses<br>空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化
%A Liu Cheng Sen
%A Wang De Zhen
%A <br>刘成森
%A 王德真
%J 物理学报
%D 2003
%I 
%X The temporal evolution of the plasma sheath during plasma source ion implantation(PSII) is crucial because it affects the resultant surface properties and structures. In this paper two dimensional fluid model is applied to the problem in computing ion dynamics in the sheath of the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses. The ion density, flux, dose distributions are calculated by solving Poisson's equation and the equations of ion motion and continuity using finite difference methods. Our results indicate that there exist the differences of ion flux and dose among the inner, outer surfaces and the end surface of the bore.
%K PSII
%K ion sheath
%K two-dimensional model
%K ion density
%K ion dose<br>等离子体源离子注入，鞘层，流体模型，离子密度，离子注入剂量
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=79D4C8F75F87D75F&yid=D43C4A19B2EE3C0A&vid=286FB2D22CF8D013&iid=CA4FD0336C81A37A&sid=91C9056D8E8856E0&eid=DDD31293A7C7D057&journal_id=1000-3290&journal_name=物理学报&referenced_num=4&reference_num=14