%0 Journal Article
%T Preparation of titanium nitride films by pulsed high-energy-density plasma and investigation of the tribological behavior of the film<br>脉冲高能量密度等离子体法制备TiN薄膜及其摩擦磨损性能研究
%A Liu Yuan-Fu
%A Zhang Gu-Ling
%A Wang Jiu-Li
%A Liu Chi-Zi
%A Yang Si-Ze
%A <br>刘元富
%A 张谷令
%A 王久丽
%A 刘赤子
%A 杨思泽
%J 物理学报
%D 2004
%I 
%X Supper hard and wear resistant titanium nitride films were deposited onto 0.45% carbon steel substrate by pulsed high-energy-density plasma(PHEDP) technique at ambient temperature. The microstructure, surface compositions and depth profile of the film were analyzed by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and scanning electron microscopy (SEM).The hardness profile and tribological behavior of the film were determined with nano-indenter and MM200 wear tester, respectively. The results showed that the microstructure of the film was dense and uniform and mainly composed of titanium nitride phases. A wide mixing interface existed between the film and the substrate. The film possessed a very high value of nanohardness. The wear resistance of the film was excellent and the value of the friction coefficient of the film was low under dry sliding wear test conditions.
%K PHEDP
%K titanium nitride film
%K microstructure
%K wear resistance<br>脉冲高能量密度等离子体，
%K TiN膜，
%K 显微组织，
%K 耐磨性
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=C462046534BBFA4E&yid=D0E58B75BFD8E51C&vid=8E6AB9C3EBAAE921&iid=0B39A22176CE99FB&sid=9296A146D1D94BC4&eid=B7B25E832E7F23D8&journal_id=1000-3290&journal_name=物理学报&referenced_num=9&reference_num=14