%0 Journal Article
%T RAMAN SPECTRO-ANALYSES OF DIAMOND-FILMS DEPOSITED ON ALUMINA CERAMICS<br>氧化铝基片上沉积金刚石薄膜的Raman光谱分析
%A MO YAO-WU
%A XIA YI-BEN
%A HUANG XIAO-QIN
%A JU JIAN-HUA
%A WANG HONG
%A <br>莫要武
%A 夏义本
%A 黄晓琴
%A 居建华
%A 王鸿
%J 物理学报
%D 1997
%I 
%X Diamond films were alternatively deposited on alumina ceramic wafers by microwave plasma chemical vapor deposition (MPCVD) and hot-filament chemical vapor deposition (MPCVD).The qualities of the deposited diamond films deposited on different wafers with different deposited techniques were appraised by the method of fitting the spectra, and the domain size and strain of the films were calculated.The results of calculation were consistence with that derived from the X-ray diffraction analyses.
%K 氧化铝陶瓷
%K 集成电路基片
%K 金刚石
%K 薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=23BAA394FB15458855776BA65BC47A40&yid=5370399DC954B911&vid=D997634CFE9B6321&iid=38B194292C032A66&sid=54E527C5B72E59D8&eid=23F919F7BAF87909&journal_id=1000-3290&journal_name=物理学报&referenced_num=5&reference_num=4