%0 Journal Article
%T SMALL-ANGLE X-RAY DIFFRACTION STUDY OF AMORPHOUS MULTILAYER AND SINGLE LAYER THIN FILMS<br>非晶态多层膜和单层膜的低角X射线衍射研究
%A WU ZHI-QIANG
%A LU XIANG-DONG
%A HUANG WEN-YONG
%A LIU HONG-TU
%A JIN HUAI-CHENG
%A WANG CHANG-SUI
%A ZHOU GUI-EN
%A WU ZI-QIN
%A <br>吴志强
%A 吕向东
%A 黄文勇
%A 刘洪图
%A 金怀诚
%A 王昌燧
%A 周贵恩
%A 吴自勤
%J 物理学报
%D 1987
%I 
%X Small-angle X-ray diffraction study of amorphous a-Si:H/(a-SiNx:H) periodical multilayer thin films and some single layer films has been undertaken. A number of satellite peaks were found in the lower side of Bragg diffraction peaks of multilayer thin films with a less number of periods. A number of diffraction peaks were also found for the small-angle diffraction of single layer films. We have presented a simple formula for calculating the X-ray diffraction intensity of multilayer and single layer films. A satisfactory explaination of experimental results was obtained. Consequently, a simple method for measuring the total thickness of both multilayer and single layer thin films has been presented.
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=B75F5CF1DD5B768105C4DB0209F09E10&yid=9C2DB0A0D5ABE6F8&vid=933658645952ED9F&iid=94C357A881DFC066&sid=E543FC2C7CA75C74&eid=4720E9D07E8A2290&journal_id=1000-3290&journal_name=物理学报&referenced_num=5&reference_num=0