%0 Journal Article
%T TEMPERATURE DEPENDENCE OF ELECTRIC RESISTIVITY OF Nd-Fe AMORPHOUS THIN FILMS AND ITS THERMAL STABILITY<br>非晶Nd-Fe薄膜电阻的温度效应与非晶稳定性
%A 吕曼祺
%A A. WAGENDRISTEL
%J 物理学报
%D 1993
%I 
%X The NdxFe1-x amorphous thin films with x=0.06-0.80 were prepared at 77 K by flash evaporation. The results show that the amorphous films are stable at room temperature when 0.192 and T untill the crystallization occurs. The crystallization of the amorphous films can not be completed at a certain fixed temperature but over a temperature range.
%K 金属玻璃
%K 薄膜
%K 电阻
%K 温度
%K 稳定性
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=DE574F04278B50AB9FB99F09D071942D&yid=D418FDC97F7C2EBA&vid=ECE8E54D6034F642&iid=94C357A881DFC066&sid=F7B726EE3ACCF328&eid=5EB19D41D7A73119&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=2