%0 Journal Article
%T THE GROWTH CHARACTER AND ADHESION OF CUBIC BORON NITRIDE THIN FILMS<br>立方氮化硼薄膜的生长特性与粘附性研究
%A MA XI-YING
%A YUE JIN-SHUN
%A HE DE-YAN
%A CHEN GUANG-HUA
%A <br>马锡英
%A 岳金顺
%A 贺德衍
%A 陈光华
%J 物理学报
%D 1998
%I 
%X Cubic boron nitride (c-BN) thin films were deposited on silicon,nickel,stainless steel and Ni-coated silicon substrates by hot filament enhanced plasma chemical vapor deposition (CVD).The films were characterized by infrared spectroscopy(IR), X-ray diffraction, scanning electron microscopy(SEM),and X-ray photoelectron spectra(XPS).It was found that the quality of c-BN thin films varied with deposition conditions and substrates.Under optimum conditions,thin films with high percentage of c-BN and good adhesion were deposited on Ni substrate.When sputtering a Ni interlayer on Si substrate prior to the growth,the c-BN content of the films increased and an excellent adhesion was obtained.
%K C－BN
%K 粘附性
%K 立方氮化硼
%K 薄膜生长
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=478BD5F0F36565A6B86F45D2C12CC813&yid=8CAA3A429E3EA654&vid=F4B561950EE1D31A&iid=94C357A881DFC066&sid=1F8584045E0BED57&eid=4AA5FA7F666BDD0A&journal_id=1000-3290&journal_name=物理学报&referenced_num=1&reference_num=1