%0 Journal Article
%T APPROCHING TO SATURATION OF Ni/NiO INTERFACE<br>Ni/NiO界面的高场磁化研究
%A WANG WEN-NAI
%A JIANG ZHENG-SHENG
%A SANG HAI
%A CHENG GUANG-XU
%A GE XIANG
%A DU YOU-WEI
%A <br>王文鼐
%A 蒋正生
%A 桑海
%A 程光熙
%A 葛翔
%A 都有为
%J 物理学报
%D 1996
%I 
%X The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiO multi-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperatures below 80 K, an abnormal enhanced magnetization under external magnetic field (H = 40kOe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 kOe) magnetization (approching to saturation) of ultrafine particles and multi-thin layers were also measured. The fit results for experimental data indicate that the interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.
%K 多层膜
%K 镍／氧化镍
%K 界面
%K 磁化强度
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=7411BF4698E837344F9FB1D59E1885F1&yid=8A15F8B0AA0E5323&vid=94E7F66E6C42FA23&iid=CA4FD0336C81A37A&sid=B0EBA60720995721&eid=769BD58726D66E7D&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=3